| 摘要 |
A photo-resist dispensing apparatus is disclosed and comprises; a tank adapted to hold a photo-resist solution, a pump unit adapted to pump the photo-resist solution from the tank, a filter unit adapted to receive the photo-resist solution from the pump unit, and at least one of a first gas discharge unit connected to the tank and adapted to remove gas bubbles from the photo-resist solution held in the tank, and a second gas discharge unit connected to the filter unit and adapted to remove gas bubbles from the photo-resist solution in the filter.
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