摘要 |
<p>A method for manufacturing a capacitor, which includes: accelerating conductor particles (4) by ejecting the conductor particles together with gas, each of the conductor particles (4) covered with a dielectric (6); fixing the conductor particles to a substrate with the conductor particles still covered with the dielectric by colliding the conductor particles with the substrate (16); and sandwiching a deposited film (12) formed of the conductor particles fixed to the substrate between electrodes (14,16). In the gas deposition method fine particles are accelerated by gas to a velocity equal to or higher than sound velocity and collide violently with a substrate. Due to the impact during collision, the fine particles are fixed to the substrate and a thick film is formed.</p> |