发明名称 |
A HIGH VOLTAGE POWER SUPPLY FOR AN ION IMPLANTER |
摘要 |
PURPOSE: A high voltage power supply for an ion implanter is provided to reduce an installation space by combining a plurality of small high voltage module with a power supply unit for supplying power to a high voltage terminal. CONSTITUTION: In a device, a high voltage terminal(100) is accommodated into an ion-implanter module. A power supply unit(200) supplies operation power to the ion-implanter module comprised of an insulated rod(220) and a generator(320). A plurality of small high voltage power source module(300) supplies a high voltage for the acceleration of the ion beam in the high voltage terminal. A gear-box is connected to the insulating rod and is operated by rotation of the insulating rod. The generator is connected to the gear-box and is operated by the operation of gear-box. The high voltage power source is connected to the generator.
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申请公布号 |
KR100933011(B1) |
申请公布日期 |
2009.12.21 |
申请号 |
KR20080128536 |
申请日期 |
2008.12.17 |
申请人 |
KOREA ATOMIC ENERGY RESEARCH INSTITUTE |
发明人 |
CHO, YONG SUB;HONG, IN SEOK;PARK, BUM SIK |
分类号 |
H01J37/02;H01J37/317;H01L21/265 |
主分类号 |
H01J37/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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