SUBSTRATE SUPPORTING UNIT AND MANUFACTURING METHOD OF THE SUBSTRATE SUPPORTING UNIT

摘要

PURPOSE: A substrate supporting unit and a manufacturing method of a substrate supporting unit are provided to uniformly adjust the temperature distribution of a susceptor by using a reflecting mirror. CONSTITUTION: In a device, a substrate processing apparatus(100) includes a chamber(11) of a cylindrical shape. A susceptor(12) of a disc shape supporting the wafer(W) is arranged inside the chamber. The susceptor is supported by the support(13). A guide ring(14) for guiding the wafer is installed at the edge of the susceptor. The first and second heaters(15a,15b) are mounted inside susceptor. The first heater mainly heats the center area of the susceptor. The second heater mainly heats the edge of the susceptor. A heat-sinking member(20) is installed on the bottom of the susceptor, and it is contacted with the bottom of the susceptor.