CYLINDRICAL SPUTTERING TARGET AND METHOD FOR MANUFACTURING THE SAME

摘要

Provided is a ceramics cylindrical sputtering target configured to significantly reduce the occurrence of a crack, a chip, extraordinary discharge and nodule.  A cavity is made of a ceramics cylindrical target material and a cylindrical base material.  The cavity is filled with a melt bonding material.  Cooling starts from one edge in the cylindrical axial direction to the other edge in sequence.  The melt bonding material is further filled in the cavity during the cooling.  Hence, manufactured is a ceramics cylindrical sputtering target characterized in that the total sum area of those portions of an X-ray transparent photograph where the bonding material does not exist is equal to or less than 10 cm2 per 50 cm2 of X-ray transparent photograph area and the maximum area of the portions where the bonding material does not exist is equal to or less than 9 cm2.