发明名称 |
POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND |
摘要 |
A compound represented by general formula (I) shown below; and a polymeric compound having a structural unit (a0) represented by general formula (a0-1) shown below: wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; A represents a divalent hydrocarbon group of 2 or more carbon atoms which may have a substituent; B represents a divalent hydrocarbon group of 1 or more carbon atoms which may have a substituent; and R2 represents an acid dissociable, dissolution inhibiting group.
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申请公布号 |
US2009312573(A1) |
申请公布日期 |
2009.12.17 |
申请号 |
US20090536779 |
申请日期 |
2009.08.06 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
SHIONO DAIJU;DAZAI TAKAHIRO;SHIMIZU HIROAKI |
分类号 |
C07C69/734;C07C69/708 |
主分类号 |
C07C69/734 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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