发明名称 CROSS-COUPLED TRANSISTOR LAYOUTS IN RESTRICTED GATE LEVEL LAYOUT ARCHITECTURE
摘要 A first P channel transistor and a first N channel transistor are defined by first and second gate electrodes, respectively. The second gate electrode is electrically connected to the first gate electrode. A second P channel transistor and a second N channel transistor are defined by third and fourth gate electrodes, respectively. The fourth gate electrode is electrically connected to the third gate electrode. Each of the first P channel transistor, first N channel transistor, second P channel transistor, and second N channel transistor has a respective diffusion terminal electrically connected to a common node. Each of the first, second, third, and fourth gate electrodes is defined to extend along any of a number of parallel oriented gate electrode tracks without physically contacting a gate level feature defined within any gate level feature layout channel associated with a gate electrode track adjacent thereto.
申请公布号 WO2009114680(A3) 申请公布日期 2009.12.17
申请号 WO2009US36937 申请日期 2009.03.12
申请人 TELA INNOVATIONS, INC.;BECKER, SCOTT, T. 发明人 BECKER, SCOTT, T.
分类号 H01L27/105;H01L21/336;H01L27/11;H01L29/78 主分类号 H01L27/105
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