发明名称 ALUMINUM OXIDE PARTICLE AND POLISHING COMPOSITION CONTAINING THE SAME
摘要 <p>Disclosed are aluminum oxide particles wherein primary particles have a hexahedral shape and an aspect ratio of 1-5.  The average primary particle diameter of the aluminum oxide particles is preferably 0.01-0.6 µm.  The a-particle ratio in the aluminum oxide particles is preferably 5-70%.  The average secondary particle diameter of the aluminum oxide particles is preferably 0.01-2 µm, and the value obtained by dividing the 90% particle diameter of the aluminum oxide particles by the 10% particle diameter is preferably 3 or less.  The aluminum oxide particles are used as abrasive grains for polishing semiconductor device substrates, hard disk substrates or display substrates.</p>
申请公布号 WO2009151120(A1) 申请公布日期 2009.12.17
申请号 WO2009JP60766 申请日期 2009.06.12
申请人 FUJIMI INCORPORATED;MORINAGA, HITOSHI;TAHARA, MUNEAKI;MATSUNAMI, YASUSHI 发明人 MORINAGA, HITOSHI;TAHARA, MUNEAKI;MATSUNAMI, YASUSHI
分类号 B24B37/00;C01F7/02;C09K3/14;H01L21/304 主分类号 B24B37/00
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