发明名称 PATTERN INSPECTION METHOD, PATTERN INSPECTION APPARATUS AND PATTERN PROCESSING APPARATUS
摘要 <p>In a defect judgment operation using tolerance which allows a high-speed operation, the amount of deformation is obtained from an image pickup pattern image and tolerance including the deformation is produced by deforming a reference pattern image which is the basis of the tolerance in accordance with the above deformation, and even if there is some deformation in an image pickup pattern, only breaks or contacts are judged as abnormal. An abnormality of an object pattern is judged by using a reference pattern storage unit for storing data based on a reference pattern corresponding to the object pattern the abnormality of which is to be detected, an image data storage means for storing data based on image data obtained by picking up an image of the object pattern, a tolerance generation means for generating data based on the tolerance of the object pattern by using the data based on the reference pattern in the reference pattern storage means and the data based on image pickup image data in the image data storage means, the data based on the tolerance generated by the tolerance generation means and the data based on the image pickup image data in the image data storage means.</p>
申请公布号 WO2009151105(A1) 申请公布日期 2009.12.17
申请号 WO2009JP60717 申请日期 2009.06.05
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION;SHINODA, SHINICHI;TOYODA, YASUTAKA;MATSUOKA, RYOICHI 发明人 SHINODA, SHINICHI;TOYODA, YASUTAKA;MATSUOKA, RYOICHI
分类号 H01L21/66 主分类号 H01L21/66
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