METHOD FOR FORMING SURFACE PROTECTIVE FILM AND DEVICE FOR FORMING SURFACE PROTECTIVE FILM

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a surface protective film and a device for forming the surface protective film, for reducing degradation of a halftone phase shift mask during cleaning.

SOLUTION: The method for forming the surface protective film includes: irradiating a halftone phase shift mask prepared by coating a quartz substrate with an MoSiO or MoSiON molybdenum silicide film and a chromium-based light-shielding film with excimer light in a range from 126 nm UV rays to 172 nm UV rays while introducing ultra-clean air or a mixture gas containing nitrogen and oxygen into a sealed chamber and forming an oxide protective film on the surface of the molybdenum silicide film; and controlling variation in the phase difference of the mask per a single cleaning process to be not more than 0.2°.

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