发明名称 ION INJECTING DEVICE AND BEAM ORBIT CORRECTION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To bring an orbit of an ion beam incident into an analyzing slit closer to the beam orbit on design even if the orbit of ion beam emitted from an ion source is shifted from the beam orbit on design by being affected by the Y-direction magnetic field in the ion source. Ž<P>SOLUTION: The extraction electrode of the ion source 10a is divided into a first and a second extraction electrodes 22a, 22b, then, DC power sources 52a, 52b to form a potential difference between both the electrodes, a camera 80 which photographs the ion beams 2 and outputs those image data, and a back stage beam measuring instrument 70 which measures beam current I<SB>2</SB>of the ion beams 2 passing through the analyzing slit 40 are installed. An analyzing electromagnet current I<SB>3</SB>is adjusted so that it may become maximum, then, deviation angle from a design value of the beam orbit incident into the analyzing slit is obtained based on the image data from the camera, and the potential difference between both the extraction electrodes is adjusted so that it may become smaller. By repeating the adjustment, the deviation angle is made to come within an allowable range. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009295475(A) 申请公布日期 2009.12.17
申请号 JP20080149162 申请日期 2008.06.06
申请人 NISSIN ION EQUIPMENT CO LTD 发明人 IAI TETSUYA;YAMASHITA TAKATOSHI;IKEJIRI TADASHI
分类号 H01J37/317 主分类号 H01J37/317
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