| 摘要 |
A projection exposure apparatus includes an aperture stop that includes a light attenuation part that is located between a light shielding part and an opening part, and has a transmittance larger than that of the light shielding part and smaller than that of the opening part. A width of the light attenuation part is set within a range from a wavefront splitting period of the wavefront splitting device or a value of Zxtan(arcsin(alpha))/2 to a length that is five times as long as the wavefront splitting period of the wavefront splitting device, where a is a numerical aperture on an exit side of the wavefront splitting device, and Z is a distance between the focal plane of the wavefront splitting device on the exit side and the aperture stop.
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