| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of cleaning a release film which can be easily performed at a low cost, as well as is best-suited for recycling a release film. <P>SOLUTION: This method of cleaning the release film having a base film and a release layer formed on the base film, comprises a cleaning process to clean a foreign substance deposited on the surface of a release layer with a cleaning fluid containing an organic solvent, and a solvent removing process to remove the cleaning fluid deposited on the surface of the release layer. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
