| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which can prevent a pin, which supports a substrate to be treated, from being imprinted to the substrate. SOLUTION: The substrate processing apparatus includes: a chamber 106 which accommodates a substrate G to be treated; a pressure reducing means 142 which reduces the pressure within the chamber 106; a plurality of lift pins 128 which are arranged within the chamber 106 and support the substrate G from a lower position; a lift pin moving up/down means 126 which treats some of the plurality of lift pins 128 as a group and moves up and down the lift pins 128 within each group independently, respectively; a substrate temperature range detecting means 133 which detects the temperature of the substrate G, which changes with reduced pressure drying treatment while delimiting the temperature in a predetermined range; lift pin temperature adjusting means 131 and 132 which, in each of lift pins 128 within the group, sets a contact part with the substrate G in the pin to a predetermined temperature included in the temperature range detected by the substrate temperature range detection means 133; and a control means 133 which performs drive control of the lift pin moving up/down means 126. COPYRIGHT: (C)2010,JPO&INPIT |
