| 发明名称 |
SUBSTRATE TABLE, LITHOGRAPHIC EQUIPMENT, AND METHOD FOR MANUFACTURING DEVICE |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To disclose a table having apertures for providing an oil immersion liquid on an upper surface of the table. <P>SOLUTION: There are provided two apertures. A first aperture encloses a substrate support of the table and a second aperture is extended to the circumference of an outer edge in the table. <P>COPYRIGHT: (C)2010,JPO&INPIT |
| 申请公布号 |
JP2009295978(A) |
申请公布日期 |
2009.12.17 |
| 申请号 |
JP20090126047 |
申请日期 |
2009.05.26 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
CASTELIJNS HENRICUS JOZEF;KATE NICOLAAS TEN;SERGEI SHULEPOV;ARTS PETRUS MARTINUS GERARDUS JOHANNES |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
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