| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for performing exposure in even radiation in a lithographic apparatus using a programmable array. <P>SOLUTION: If a patterned beam of radiation which was patterned using an individually controllable elements is projected onto a target portion of a substrate, (a) each pixel ordinarily controls elements so as to deliver a radiation dose no greater than a predetermined normal maximum dose to the target portion in an exposure step, and (b) at least one selected pixel exceptionally controls the elements so as to deliver an increased radiation dose greater than the normal maximum dose. The increased dose may be delivered to compensate for the effect of a defective pixel at a known position in the array on a pixel adjacent a selected pixel. Further, it may compensate for underexposure of the target portion at the location of a selected pixel resulting from exposure of that location to a pixel affected by a known defective element. <P>COPYRIGHT: (C)2010,JPO&INPIT |
