发明名称 METHOD OF MANUFACTURING HEAT DISSIPATION STRUCTURE, AND HEAT DISSIPATION STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a heat dissipating material which has high thermal conductivity and comes into contact with fine unevenness on a surface of a heat generating source by entering gaps thereof without any clearance, and a method of manufacturing the same. SOLUTION: The method of manufacturing the heat dissipation structure is characterized in supplying a current to an SiC substrate or a substrate having an SiC layer on at least one surface, heating SiC with Joule heat generated when the current is supplied, and forming an SiC whisker layer on the SiC surface of the substrate. Further, the specific resistance of the substrate is≤1×10<SP>-1</SP>Ωcm. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009295894(A) 申请公布日期 2009.12.17
申请号 JP20080150084 申请日期 2008.06.09
申请人 SUMITOMO ELECTRIC IND LTD 发明人 KAWAI CHIHIRO
分类号 H01L23/36;H01L23/373 主分类号 H01L23/36
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