发明名称 Method for Making Micro-Electromechanical System Devices
摘要 A method for making micro-electromechanical system devices includes: (a) forming a sacrificial layer on a device wafer; (b) forming a plurality of loop-shaped through-holes in the sacrificial layer so as to form the sacrificial layer into a plurality of enclosed portions; (c) forming a plurality of cover caps on the sacrificial layer such that the cover caps respectively enclose the enclosed portions of the sacrificial layer; (d) forming a device through-hole in each of active units of the device wafer so as to form an active part suspended in each of the active units; and (e) removing the enclosed portions of the sacrificial layer through the device through-holes in the active units of the device wafer.
申请公布号 US2009311819(A1) 申请公布日期 2009.12.17
申请号 US20080244258 申请日期 2008.10.02
申请人 CHANG TSO-CHI;WU MINGCHING 发明人 CHANG TSO-CHI;WU MINGCHING
分类号 H01L21/50 主分类号 H01L21/50
代理机构 代理人
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