| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method and an apparatus capable of effectively preventing the fogging of a photomask. <P>SOLUTION: The apparatus for preventing fogging of a photomask includes a light irradiation device 21 that irradiates a photomask 10 having a light-shielding film on the surface of a glass substrate with light of≥5 J and≤100 J energy at a wavelength of≥193 nm and≤436 nm. The apparatus for preventing fogging of a photomask may include a heating device 31 that heats a photomask 10 having a light-shielding film on the surface of a glass substrate at a temperature of≥40°C and≤80°C for the period of time period of≥30 minutes to≤24 hours. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
