| 发明名称 |
Molecular Resist Compositions, Methods of Patterning Substrates Using the Compositions and Process Products Prepared Therefrom |
| 摘要 |
The present invention is directed to molecular resist compositions comprising an organic amine, methods of forming features on substrates using the molecular resists compositions and process products prepared therefrom.
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| 申请公布号 |
US2009311484(A1) |
申请公布日期 |
2009.12.17 |
| 申请号 |
US20090436436 |
申请日期 |
2009.05.06 |
| 申请人 |
NANO TERRA INC. |
发明人 |
MCLELLAN JOSEPH M.;MAYERS BRIAN T.;CHAUHAN KARAN;SAADI WAJEEH |
| 分类号 |
B32B3/10;B44C1/22;C09K3/00 |
主分类号 |
B32B3/10 |
| 代理机构 |
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