发明名称 PROCESS CONTROL DEVICE AND METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a process control device and method that is robust against disturbance and reduces maintenance frequency more than heretofore. <P>SOLUTION: A determination part read out device data generated from a sensor included in a process apparatus and determines whether the process apparatus an ordinary state. When the determination part determines that the process apparatus is the ordinary state, a correction value calculation part calculates a recipe correction value by using measurement data generated from a measurement instrument arranged behind the process apparatus and the apparatus data. Then, a recipe correction part corrects a recipe to be supplied to the process apparatus based on the correction value output from the correction value calculation part and transmits the corrected recipe to the process apparatus. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2009295700(A) 申请公布日期 2009.12.17
申请号 JP20080146305 申请日期 2008.06.03
申请人 SONY CORP 发明人 HIRAI TOSHIYA;SON BINKEI
分类号 H01L21/02;G05B19/418 主分类号 H01L21/02
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