APPARATUS FOR COATING PHOTORESIST ON SUBSTRATE

摘要

PURPOSE: An apparatus for coating photoresist is provided to prevent the photoresist coating inferiority of a substrate by removing the particles on a rail where a gantry is moved. CONSTITUTION: An apparatus for coating photoresist comprises a base(1); transfer units(3,5) installed at the base; a gantry(7) which is combined to the transfer units so as to move linearly; a slit nozzle which is combined with the gantry; and rail particle removing parts(11,13) which are installed on the gantry to remove the particles fallen on the transfer units. The rail particle removing parts are combined with a vibration isolation member which is combined with the gantry to block the transfer of vibration to the gantry.