| 摘要 |
<P>PROBLEM TO BE SOLVED: To reliably separate and collect a first processing liquid and a second processing liquid and to reliably prevent the occurrence of defects such as a watermark and particles on a workpiece. Ž<P>SOLUTION: A liquid processing apparatus 1 includes: a substrate holding mechanism 20; a processing liquid supply mechanism 30 for supplying the first processing liquid and the second processing liquid; a rotary cup 61; an outside discharge unit 15 and an inside discharge unit 16 which discharge the first processing liquid and the second processing liquid received by a first receiving surface 61a of the rotary cup 61, respectively; and a discharge unit opening and closing mechanism 34 for opening and closing the outside discharge unit 15. The lower end 61b of the first receiving surface 61a of the rotary cup 61 is extended downward from the substrate W to be processed which is held by the substrate holding mechanism 20. When the discharge unit opening and closing mechanism 34 is moved upward, the first processing liquid is discharged to the outside discharge unit 15, and when the discharge unit opening and closing mechanism 34 is moved downward, the second processing liquid is discharged to the inside discharge unit 16. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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