| 摘要 |
The invention relates to a machine for processing vessels by the vacuum-deposition of a carbon-particle coating from a precursor gas, wherein the machine includes at least one measuring instrument (16, 16') communicating via an appropriate circuit with the processing area of the vessel in which are formed, by microwave radiation, particles developed in the form of a plasma from a precursor gas of the acetylene type fed into the vessel by an injector (18). The measuring instrument is subjected to a continuous cycle of pressure variations ranging from a value that corresponds to a quasi-vacuum for the vessel processing phase, to a value that corresponds to the atmospheric pressure for the phase comprising the removal of the processed vessels and the supply of new vessels. In order to protect the measuring instrument (16, 16'), the machine includes a constant load-loss filtration device that comprises a cyclofilter (21) including a settling chamber (26) provided between a tangential centrifugation duct (23) and a tapping duct (24), wherein said cyclofilter is connected to the segment of the circuit extending up to the area where said vessels are processed via the tangential centrifugation duct (23), and to the segment of the circuit extending up to the measuring instrument via the tapping duct (24). |
