发明名称 GAS SUPPLY METHOD AND GAS SUPPLY DEVICE
摘要 A gas supply method in which a solid raw material in a raw material container is heated and vaporized to produce raw material gas to be supplied to a consuming area. The gas supply method has a step (a) of causing carrier gas to flow to a processing gas supply path that communicates with the consuming area and measuring gas pressure in the processing gas supply path; a step (b) of heating the solid raw material contained in the raw material container to produce the raw material gas; a step (c) of supplying carrier gas which has the same flow rate as the carrier gas in the step (a) to the raw material container and measuring gas pressure in the processing gas supply path while causing the raw material gas together with the carrier gas to flow to the processing gas supply path; and a step (d) of calculating the flow rate of the raw material gas based on the pressure measurement value obtained in the step (a), the pressure measurement value obtained in the step (c), and the flow rate of the carrier gas.
申请公布号 KR20090129444(A) 申请公布日期 2009.12.16
申请号 KR20097020116 申请日期 2008.03.26
申请人 TOKYO ELECTRON LIMITED 发明人 HARA MASAMICHI;GOMI ATSUSHI;YOKOYAMA OSAMU;TANAKA TOSHIMASA;MAEKAWA SHINJI;TAGA SATOSHI
分类号 H01L21/205;C23C16/455 主分类号 H01L21/205
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