| 摘要 |
PURPOSE: A nozzle assembly for a single wafer type cleaning apparatus is provided to prevent defect of a substrate due to a chemical solution by installing an injection nozzle at a fixed position outside a chamber. CONSTITUTION: A nozzle assembly includes an injection nozzle(141), a supporting part(142) and a discharge angle control part. A cleaning liquid supply part(150) supplies a cleaning liquid to the injection nozzle. The supporting part supports the injection nozzle. The supporting part connects the cleaning liquid supply part and the injection nozzle. The injection nozzle is installed on the top of the outside of a chamber to inject the cleaning liquid to the substrate. The injection nozzle is rotated on the supporting part to a fixed angle. The discharge angle controlling part controls the injection position of the cleaning liquid by rotating the injection nozzle within a predetermined angle range. The injection nozzle injects the cleaning liquid to the surface of the substrate by controlling a discharge outlet(141a).
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