发明名称 ELECTROLYTIC TIN PLATING SOLUTION AND ELECTROLYTIC TIN PLATING METHOD
摘要 PURPOSE: An electrolytic tin plating solution and an electrolytic tin plating method are provided to lower a coupling ratio and improve solder wetting properties by not using a complexing agent. CONSTITUTION: An electrolytic tin plating solution for chip parts comprises tin ion, acid, N, N-dipolyoxyalkylene-N-alkylamine, amine oxide or a mixture thereof, and an anti-adhesion agent. The Ph of the tin plating solution is 1 or less. The tin plating solution also includes a plating uniformity improver, one or more acrylic acids or acryl derivative, and antioxidant. The anti-adhesion agent is one or more compounds selected from the group consisting of aromatic aldehyde and aromatic ketone.
申请公布号 KR20090129373(A) 申请公布日期 2009.12.16
申请号 KR20090051978 申请日期 2009.06.11
申请人 ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. 发明人 IMANARI MASAAKI;TING FAI LUNG;SHIMIZU MOTOYA;OHTA YASUO
分类号 C25D3/30;C25D7/12 主分类号 C25D3/30
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