发明名称 Shielded gate trench (SGT) MOSFET devices and manufacturing processes
摘要 This invention discloses a semiconductor power device that includes a plurality of power transistor cells surrounded by a trench opened in a semiconductor substrate. At least one of the cells constituting an active cell has a source region disposed next to a trenched gate electrically connecting to a gate pad and surrounding the cell. The trenched gate further has a bottom-shielding electrode filled with a gate material disposed below and insulated from the trenched gate. At least one of the cells constituting a source-contacting cell surrounded by the trench with a portion functioning as a source connecting trench is filled with the gate material for electrically connecting between the bottom-shielding electrode and a source metal disposed directly on top of the source connecting trench. The semiconductor power device further includes an insulation protective layer disposed on top of the semiconductor power device having a plurality of source openings on top of the source region and the source connecting trench provided for electrically connecting to the source metal and at least a gate opening provided for electrically connecting the gate pad to the trenched gate.
申请公布号 US7633119(B2) 申请公布日期 2009.12.15
申请号 US20060356944 申请日期 2006.02.17
申请人 ALPHA & OMEGA SEMICONDUCTOR, LTD 发明人 BHALLA ANUP;LUI SIK K
分类号 H01L27/108 主分类号 H01L27/108
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