发明名称 Semiconductor device having field stabilization film and method
摘要 In one embodiment, a high voltage semiconductor device is formed with a first dielectric layer and a charge stabilization layer comprising a flowable glass formed over the first dielectric layer.
申请公布号 US7632760(B2) 申请公布日期 2009.12.15
申请号 US20050099895 申请日期 2005.04.07
申请人 SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC 发明人 TU SHANGHUI LARRY;ISHIGURO TAKESHI;KURAMAE FUMIKA;OMI RYUJI
分类号 H01L21/31;H01L21/469 主分类号 H01L21/31
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