发明名称 |
UV light exposure for functionalization and hydrophobization of pure-silica zeolites |
摘要 |
A method is provided for making pure-silica-zeolite films useful as low-k material, specifically, more hydrophobic, homogeneous and with absence of cracks. The method utilizes a UV cure; preferably the UV cure is performed at temperatures at higher than the deposition temperature. The UV-assisted cure removes the organic template promoting organic functionalization and silanol condensation, making the silica-zeolite films more hydrophobic. Moreover, the zeolite material is also mechanically stronger and crack-free. The method can be used to prepare pure-silica-zeolite films more suitable as low-k materials in semiconductor processing.
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申请公布号 |
US7632771(B2) |
申请公布日期 |
2009.12.15 |
申请号 |
US20070702706 |
申请日期 |
2007.02.06 |
申请人 |
IMEC;KATHOLIEKE UNIVERSITEIT LEUVEN (KUL) |
发明人 |
IACOPI FRANCESCA;FERNANDEZ SALVADOR ESLAVA;KIRSCHHOCK CHRISTINE;MARTENS JOHAN |
分类号 |
B01J29/06;B01J20/28;B01J21/08 |
主分类号 |
B01J29/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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