发明名称 |
Circuit pattern exposure method and mask |
摘要 |
A circuit pattern exposure method for irradiating illumination light onto a mask to transfer (offset) mask patterns that are formed in the mask to a semiconductor substrate, wherein the mask includes a plurality of main mask patterns that are arranged at a prescribed pitch and auxiliary mask patterns that are arranged outside the outermost main mask pattern and that are not to be transferred (offset) to the semiconductor substrate; the auxiliary mask patterns are provided with a first auxiliary mask row that is arranged adjacent to the outermost main mask pattern and a second auxiliary mask row that is arranged adjacent to the first auxiliary mask row; and the first auxiliary mask row and the second auxiliary mask row are arranged at a pitch that is narrower than the pitch of arrangement of the main mask patterns.
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申请公布号 |
US7632614(B2) |
申请公布日期 |
2009.12.15 |
申请号 |
US20070648541 |
申请日期 |
2007.01.03 |
申请人 |
ELPIDA MEMORY, INC. |
发明人 |
KOSA NOBUE;YASUZATO TADAO |
分类号 |
G03F1/36;G03F1/70;H01L21/027 |
主分类号 |
G03F1/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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