| 摘要 |
<p>PURPOSE: An exposure apparatus and a method of manufacturing device are provided to maximize the accuracy and productivity of an exposure apparatus by measuring an error of an optical axis of a transparent optical system without exposure process. CONSTITUTION: In a device, a first measuring unit measures the location of the substrate stage in an optical axial when a substrate stage is scanned to the first direction. A second measuring unit measures the surface(11) of the substrate in an optical axis at a plurality of measuring points. A controller controls the second measuring unit to measure the same area on the substrate at the plurality of points and measures an error of the first measuring unit based on the result of the second measuring unit.</p> |
