PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, AND METHOD FOR PATTERN FORMING

摘要

PURPOSE: A photosensitive resin composition, and a pattern formation method using the composition are provided to reduce the content of halogen, to improve sensitivity and resolution, and to allow it to be cured without using an antimony-based or phosphorus-based strong acid generator. CONSTITUTION: A photosensitive resin composition comprises an acrylic epoxy resin; an acrylate monomer having at least one crosslinking site; and a photopolymerization initiator. The acrylic epoxy resin has a unit derived from a monomer having a group represented by the formula 1 and a monomer having a group represented by the formula 2, wherein at least one of R1 ~ R3 is -OR4; and the rest of R1 ~ R3 and R4 are a hydrogen atom or a monovalent organic group capable of having a substituent.