| 摘要 |
PROBLEM TO BE SOLVED: To provide a laser beam/UV irradiation peripheral exposure apparatus, capable of responding to a substrate, even if an identification mark is formed at any position in a peripheral region. SOLUTION: The apparatus comprises a stage 2 for holding a substrate W; an imaging means 4 for imaging a preliminarily determined position of the substrate and a positioning mark, disposed corresponding to a preliminarily determined reference position on the stage for acquiring image data; a moving and carrying mechanism 3 for moving the stage; a laser beam unit 5 on a moving path of the moving and carrying mechanism and for irradiating the substrate with a laser beam; a UV irradiation unit 9 for irradiating the peripheral region of the substrate with a light containing UV rays from an irradiation port; and a control means 20 for controlling the moving and carrying mechanism so as to align the substrate, based on the image data acquired from the imaging means, and to simultaneously expose the identification mark with a laser beam and to expose the peripheral region with a light containing UV rays. COPYRIGHT: (C)2007,JPO&INPIT
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