发明名称 APPARATUS AND METHOD FOR PROCESSING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To inexpensively constitute a sliding-type peeling mechanism of a substrate to be processed, which securely peels the substrate to be processed without destroying it in substrate processing apparatus/method. SOLUTION: A vacuum chuck with heating mechanism, which adsorbs a supporting substrate, and one vacuum chuck in vacuum chucks adsorbing the substrate to be processed are connected to an arm-like supporting member operating in a horizontal direction by a member which expands and contracts. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009289878(A) 申请公布日期 2009.12.10
申请号 JP20080139278 申请日期 2008.05.28
申请人 FUJITSU LTD 发明人 OKAMOTO NAOYA
分类号 H01L21/02;H01L21/304;H01L21/683 主分类号 H01L21/02
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