| 摘要 |
<P>PROBLEM TO BE SOLVED: To achieve highly pure cleaning and to obtain a cleaning device with high cleaning effect in the middle of manufacture of semiconductor structure and a liquid crystal substrate having minute structure. Ž<P>SOLUTION: In the cleaning device which mixes, injects pressurized gas and liquid to remove contamination on an object to be cleaned held in a cleaning cup 1 in a nozzle 5 provided on the cleaning cup 1, a gas supply line 7 and a liquid supply line 12 are connected to the nozzle 5, the liquid supply line 12 is provided with at least the following components, a first opening/closing valve 14, a filter 13 for liquid, and a flowmeter 15, the above components and piping for connecting them are provided by being located at a lower part of a connection port of the nozzle 5, and the liquid supply line 12 is provided with the first opening/closing valve 14, the filter 13 for liquid, and the flowmeter 15 in this order from the side of the nozzle 5. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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