发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for photospacers which has good alkali developability and of which a cured product has excellent flexibility and elastic recovery property. <P>SOLUTION: The alkali-developable photosensitive resin composition (Q) for photospacers includes a hydrophilic resin (A), a polyfunctional (meth)acrylate monomer (B), a carboxyl group-modified cellulose (C), and a photoradical polymerization initiator (D). <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009288544(A) 申请公布日期 2009.12.10
申请号 JP20080141339 申请日期 2008.05.29
申请人 SANYO CHEM IND LTD 发明人 YAMAMOTO YUSUKE
分类号 G03F7/032;G02F1/1339;G03F7/004 主分类号 G03F7/032
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