发明名称 |
METHODS FOR MODEL-BASED PROCESS SIMULATION |
摘要 |
<p>Lithography simulation using a differential model. The differential model describes differences in the imaging characteristics of two scanners related to tunable and non-tunable scanner settings. A model for one of the two scanners is derived by using the model of the other scanner and the differential model. Similarly, a sensitivity model expresses the differences in the imaging characteristics of one scanner related to different scanner settings. Additionally, methods are provided for calibrating the differential model and the sensitivity model by comparison with printing results.</p> |
申请公布号 |
WO2009148972(A1) |
申请公布日期 |
2009.12.10 |
申请号 |
WO2009US45726 |
申请日期 |
2009.05.29 |
申请人 |
BRION TECHNOLOGIES, INC. |
发明人 |
YE, JUN;CAO, YU;GOOSSENS, RONALD;SHAO, WENJIN;KOONMEN, JIM |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|