Flow restrictor for use in evaporator utilized in semiconductor applications to restrict flow of e.g. process gas, has surface mount valve, where throttle stages are formed for making flow speed to reach ultrasonic within restrictor

摘要

The restrictor (1) has a construction element (2) for modular valve retention of a surface mount valve (3). Multiple throttle stages are set with a conductance value which increases in a flow direction and a flow cross-section extension. The throttle stages are formed such that a multi-stage pressure reduction of process gas takes place on one side and a friction resistance takes place opposite to expansion acceleration of the process gas at other side for making the flow speed to reach ultrasonic within the restrictor during initiating supply of process gas. An independent claim is also included for a method for evaporating gases.