发明名称 METHOD FOR MAKING ORIENTED TANTALUM PENTOXIDE FILMS
摘要 <p>Methods of forming an oxide are disclosed and include contacting a ruthenium-containing material (130) with a tantalum-containing precursor and contacting the ruthenium-containing material with a vapor that includes water and optionally molecular hydrogen (H2). Articles including a first crystalline tantalum pentoxide (140) and a second crystalline tantalum pentoxide (150) on at least a portion of the first crystalline tantalum pentoxide, wherein the first tantalum pentoxide has a crystallographic orientation that is different than the crystallographic orientation of the second crystalline tantalum pentoxide, are also disclosed.</p>
申请公布号 WO2009148799(A1) 申请公布日期 2009.12.10
申请号 WO2009US44084 申请日期 2009.05.15
申请人 MICRON TECHNOLOGY, INC;BHAT, VISHWANATH;ANTONOV, VASSI 发明人 BHAT, VISHWANATH;ANTONOV, VASSI
分类号 C23C16/40;C23C16/448 主分类号 C23C16/40
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