| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative resist composition for immersion exposure capable of forming a resist film with high hydrophobicity of the film surface and having good lithography characteristics, and a method of forming a resist pattern using the negative resist composition for immersion exposure. <P>SOLUTION: The negative resist composition for immersion exposure is characterized by including a fluorine-containing polymeric compound (F) containing a structural unit having a base dissociable group, an alkali-soluble resin component (A) excluding the fluorine-containing polymeric compound (F), an acid generator component (B) that generates acid upon exposure, and a crosslinking component (C). The method of forming a resist pattern includes processes for forming a resist film on a substrate using the negative resist composition for immersion exposure, subjecting the resist film to immersion exposure, and forming a resist pattern by subjecting the resist film to alkali developing. <P>COPYRIGHT: (C)2010,JPO&INPIT |
