| 发明名称 |
GLASS ETCHING COMPOSITION FREE FROM AMMONIUM IONS AND FROM DIFLUORIDE IONS |
| 摘要 |
Process for preparing a glass etching solution that is free from ammonium ions and from difluoride ions, that uses hydrofluoric acid and a composition that is free from ammonium ions and from difluoride ions comprising from 30% to 100%, preferably from 40% to 70%, by weight per 100% of the total weight of at least one soluble potassium salt and from 0% to 70%, preferably from 30% to 60%, by weight per 100% of the total weight of at least one inert filler. |
| 申请公布号 |
WO2009125099(A3) |
申请公布日期 |
2009.12.10 |
| 申请号 |
WO2009FR50417 |
申请日期 |
2009.03.13 |
| 申请人 |
SOCIETE D'EXPLOITATION DE PRODUITS POUR LES INDUSTRIES CHIMIQUES SEPPIC;TROUVE, GERARD;BESSOLES, YVES;DE ROULHAC, HUGHES XAVIER |
发明人 |
TROUVE, GERARD;BESSOLES, YVES;DE ROULHAC, HUGHES XAVIER |
| 分类号 |
C03C15/00 |
主分类号 |
C03C15/00 |
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