发明名称 Electrolytic Method For Filling Holes and Cavities With Metals
摘要 Disclosed is an electroplating method for filling cavities, through holes, blind holes, or micro blind holes of a work piece with metals. According to said method, the work piece containing cavities, through holes, blind holes, or micro blind holes is brought in contact with a metal deposition electrolyte, and a voltage is applied between the work piece and at least one anode such that a current flow is fed to the work piece. The invention method is characterized in that the electrolyte encompasses a redox system.
申请公布号 US2009301889(A1) 申请公布日期 2009.12.10
申请号 US20070295513 申请日期 2007.03.30
申请人 ATOTECH DEUTSCHLAND GMBH 发明人 REENTS BERT;ROELFS BERND;MAGAYA TAFADZWA;YOUKHANIS MARKUS;WENZEL RENE;KIM SOUNGSOO
分类号 C25D5/00;C25D5/10 主分类号 C25D5/00
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