发明名称 |
Exposure method, exposure apparatus, and device manufacturing method |
摘要 |
An exposure method comprises: forming an immersion region on a substrate; exposing the substrate by irradiating the substrate with an exposure light via a liquid of the immersion region; and preventing an integration value of a contact time during which the liquid of the immersion region and a first region on the substrate are in contact, from exceeding a predetermined tolerance value.
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申请公布号 |
US2009305150(A1) |
申请公布日期 |
2009.12.10 |
申请号 |
US20060919352 |
申请日期 |
2006.04.28 |
申请人 |
NIKON CORPORATION |
发明人 |
SHIRAISHI KENICHI;FUJIWARA TOMOHARU |
分类号 |
G03F7/20;G03B27/52 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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