| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pellicle for lithography which is less deformed and distorted. <P>SOLUTION: In the pellicle for lithography, each of at least two jig holes near both ends of two long sides of a rectangular pellicle frame is located≤10 mm inside from one end part of each long side. Desirably, the length of long sides of the pellicle frame is 140 to 300 mm, and more desirably, it is 140 to 230 mm. It is desirable that a pair of jig holes facing each other out of a plurality of jig holes provided near both ends of two log sides of the pellicle frame are long in a direction of long sides of the frame. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
