发明名称 OPTICAL FILTER, FILM DEPOSITION METHOD OF THE SAME, MANUFACTURING APPARATUS FOR THE SAME, AND IMAGING LIGHT QUANTITY CONTROL DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide the film deposition method of an optical filter, with which there is little risk that the optical filter becomes distorted during the manufacture or with the lapse of time is simply manufactured at low cost. Ž<P>SOLUTION: The film deposition method of the optical filter includes: a substrate setting step of setting a substrate holder on which a substrate plate is mounted on a substrate drum arranged freely movably in a film deposition chamber; a surface film deposition step of carrying out film deposition on the surface of the substrate plate set on the substrate drum by applying sputter voltage to a target while rotating the substrate drum; a film deposition surface inverting step of rotating the substrate holder to arrange the back surface of the substrate plate to face the target, in a state that the sputter voltage is not applied to the target after the surface film deposition step; and a back surface film deposition step of carrying out film deposition on the back surface of the substrate plate, by applying the sputter voltage to the target, while rotating the substrate drum after the front and back surface are inverted, wherein the front surface and the back surface of the substrate plate are film-deposited in the same batch. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2009288294(A) 申请公布日期 2009.12.10
申请号 JP20080137786 申请日期 2008.05.27
申请人 NISCA CORP 发明人 NAKAJIMA KATSURA
分类号 G02B5/00;C23C14/06;C23C14/34;G03B9/02 主分类号 G02B5/00
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