发明名称 STRUCTURE, STRUCTURE AND METHOD FOR FABRICATION JFET IN CMOS
摘要 A design structure, and more particularly, to a design structure for manufacturing a JFET in SOI, a JFET and methods of manufacturing the JFET are provided. The JFET includes a gate poly formed directly on an SOI layer and a gate oxide layer interposed between outer edges of the gate poly and the SOI layer.
申请公布号 US2009302355(A1) 申请公布日期 2009.12.10
申请号 US20080132638 申请日期 2008.06.04
申请人 PEKARIK JOHN J;PHELPS RICHARD A;RASSEL ROBERT M;SHI YUN 发明人 PEKARIK JOHN J.;PHELPS RICHARD A.;RASSEL ROBERT M.;SHI YUN
分类号 H01L29/808;G06F17/50;H01L21/337 主分类号 H01L29/808
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