| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor treatment device capable of removing contamination in a semiconductor polluted in an atmosphere until a chamber is transferred to complete desirable treatment when the semiconductor is treated in the chamber. SOLUTION: The semiconductor treatment device has a chamber (load-lock chamber 5) with the semiconductor (substrate 1) being an object to be treated housed therein, and a vacuum-ventilating system 15-1 connected to the chamber. The vacuum-ventilating system includes a ventilating vacuum pump (vacuum pump 14-1) for ventilation the inside of the chamber, and a highly vacuuming pump 14-4 for ventilation the inside of the chamber by the ventilating vacuum pump at a highly vacuuming degree. The contamination attached by bringing the semiconductor into contact with the atmosphere can be removed at a high degree of accuracy without preparing any other treatment chambers. Thereafter, treatment can be carried out without being affected by the contamination in the atmosphere. COPYRIGHT: (C)2010,JPO&INPIT |
