发明名称 |
ADVANCED PROCESS SENSING AND CONTROL USING NEAR INFRARED SPECTRAL REFLECTOMETRY |
摘要 |
Embodiments described herein provide a method and apparatus for obtaining process information in a substrate manufacturing process using plasma. In one embodiment, a chamber is provided having one or more optical metrology modules that are positioned such that optical energy from the plasma process is detected at substantially orthogonal angles. Metrics derived from detected optical energy may be used for endpoint determination, substrate temperature, and monitoring of critical dimensions on the substrate.
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申请公布号 |
WO2009111156(A3) |
申请公布日期 |
2009.12.10 |
申请号 |
WO2009US34257 |
申请日期 |
2009.02.17 |
申请人 |
APPLIED MATERIALS, INC.;DAVIS, MATTHEW FENTON;LIAN, LEI |
发明人 |
DAVIS, MATTHEW FENTON;LIAN, LEI |
分类号 |
H01L21/66;H01L21/205;H01L21/3065;H01L21/324 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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