| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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| 申请公布号 |
US2009303455(A1) |
申请公布日期 |
2009.12.10 |
| 申请号 |
US20090541755 |
申请日期 |
2009.08.14 |
| 申请人 |
ASML NETHERLANDS B.V.;ASML HOLDING N.V. |
发明人 |
KEMPER NICOLAAS RUDOLF;MARIE COX HENRIKUS HERMAN;LAMBERTUS DONDERS SJOERD NICOLAAS;DE GRAAF ROELOF FREDERIK;HOOGENDAM CHRISTIAAN ALEXANDER;KATE NICOLAAS TEN;MARIA MERTENS JEROEN JOHANNES SOPHIA;MEULEN FRITS VAN DER;MARIA TEUNISSEN FRANCISCUS JOHANNES HERMAN;VAN DER TOORN JAN-GERARD CORNELIS;MARIA VERHAGEN MARTINUS CORNELIS;POLIZZI MARCO;MATHEUS VAN GOMPEL EDWIN AUGUSTINUS;CHRISTIAAN BELFROID STEFAN PHILIP;SMEULERS JOHANNES PETRUS MARIA;VOGEL HERMAN;ANTONIUS LEENDERS MARTINUS HENDRIKUS;OTTENS JOOST JEROEN |
| 分类号 |
G03B27/54 |
主分类号 |
G03B27/54 |
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